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Dr. Xinhua Liang
Missouri University of Science and Technology
BS ChE, Tianjin University, 2001
Surface science and catalysis, Nanostructured films and devices, Energy and environmental applications
Our research focuses on rational and directed design of nanostructured materials for efficient reactions and separations technologies. Atomic/Molecular Layer Deposition (ALD/MLD) thin film coating technique will be used for this research program. ALD/MLD is a thin film growth technique based on sequential, self-limiting surface chemical reactions and allows for precise deposition of ultra-thin, highly conformal coatings over complex 3D topography structures, with excellent control over stoichiometry and properties. The value in applying this thin film coating technology is to enable to harness the unexpected phenomena that result from the changes in structure and chemistry which occur over atomic scales at surfaces or interfaces. The second value is that the user of the material (particle or film) can save cost by using less of the most expensive substrate on the surface where the function of the material substrate is most critical.
X. Liang, N.-H. Li, and A. W. Weimer, "Templated-directed Synthesis of Porous Alumina Particles with Precise Wall Thickness Control via Atomic Layer Deposition", Microporous and Mesoporous Materials 149(1) 106-110 (2012).
X. Liang, J. Li, M. Yu, C. N. McMurray, J. L. Falconer, and A. W. Weimer, "Stabilization of Supported Metal Nanoparticles Using an Ultrathin Porous Shell", ACS Catalysis 1(10), 1162-1165 (2011).